Ultra-high performance FIB

• Low CsFIB optics（*2） deliver 50nA or more of beam current （@40kV） in an about 1µm spot-size. The high current enables unconventional large-area milling, hard material fabrication and high throughput multiple specimen preparation.

New Micro-sampling

• Hitachi's patented Micro-sampling technology provides smooth probe motion. Also, the probe can be used for newly developed absorbed current imaging（*1） to aid fault isolation.

High precision end-point detection

• High resolution SEM allows high precision end-point detection. Section-view function, which displays an outline of the cross-section utilizing the real-time FIB image, is ideal for preparing electron irradiation sensitive specimens like low-K material.

High resolution SEM

• Hitachi's unparalleled SEM column and detector design（*2） enables high resolution SEM imaging during and after FIB fabrication.

Holder compatibility with TEM/STEM（*1）（*2）

• A side entry STEM/TEM-type staqe（*1） allows the use of the same specimen holder （compatible with NB5000 and Hitachi TEM/STEM）. No tweezer handling of specimen during transfer results in higher throughput TEM/STEM analysis.

（*1）:Optional accessory
（*2）:Hitachi patent
Low Cs FIB optics: patent pending, Micro-sampling: JP2774884/US5270552, Section-view function: patent pending, SEM column and detector design: JP3081393/US5387793, Holder compatibility: JP2842083